Location : Kgs. Lyngby, Denmark
Yearly income :
CAPRES company (http://www.capres.com) offers, in collaboration with the Technical University of Denmark (DTU), a three-year (3yr) industrial postdoc position to develop the next generation of microelectrode based high precision thin film measurements. The goal is to develop methodologies to define a new metrology standard to succeed the current-in-plane tunneling method for magnetic tunnel junction characterization.
The candidate will be part of the research team at CAPRES as well as the Nanoelectronics Metrology group at DTU Nanotech. The candidate is expected to have a background in magnetic thin films or electrical characterization. To develop a new metrology standard, the candidate should possess strong analytical skills with a desire to develop practical solutions to meet industry requirements. In addition, the candidate is expected to contribute with ideas for new metrology applications by identifying yield-limiting processes in production of magnetic random access memory (MRAM).